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Micro-Electroplating for Wafer
HF vapor etching
auto wafer clean and etch hood
porous silicon etching
etch for metal and dielectric layer
KOH腐蚀
wet pss echert
process tank
tooling for electroplating and etching
Technical service
Micro-Electroplating for Wafer

The electroplating with non-cyanide for wafer is an important process and more applications in the fields of Semiconductor, MEMS, LED and Advanced package as its environmental advantages.

The micro-electroplating equipments made by MST are special for non-cyanide process with two types of R&D and productive, which can meet the different users. The micro-electroplating processes with gold, silver, copper, nickel, tin and so on are widely applied in the follow fields.

1

Semiconductor

the bump with gold, silver, solder.

2

MEMS

LIGA process; sacrificial layer with copper, structure layer, cantilever, low stress metal film, connect line, bump and electrode with gold, nickel

3

Advanced package

AuSn and CuSn solder, bump connect line, electrode, solder ring, via hole, and so on.

4

LED

gold bump, heat dissipation substrate

5

Others

micro-size function metal film

    

The details for equipments and process: http://www.szmst.com/en/tech.asp?menuid=156

Experimental type: "wafer microelectroplating hood(MP-01AR).pdf"

Productive type: "wafer microelectroplating hood(MP-01AP).pdf"

 


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